Special Section on Nanobio-Based Optical Sensing and Imaging

Pore-size reduction protocol for SiN membrane nanopore using the thermal reflow in nanoimprinting for nanobio-based sensing

[+] Author Affiliations
Dae-Sik Lee

Electronics and Telecommunication Research Institute, IT Convergence Components Laboratory, Daejeon 305-700, Republic of Korea

Hyun-Woo Song

Electronics and Telecommunication Research Institute, IT Convergence Components Laboratory, Daejeon 305-700, Republic of Korea

Choon-Gi Choi

Creative Research Center for Graphene Electronics, ETRI, Daejeon 305-700, Republic of Korea

Mun Youn Jung

Electronics and Telecommunication Research Institute, IT Convergence Components Laboratory, Daejeon 305-700, Republic of Korea

J. Biomed. Opt. 19(5), 051211 (Feb 06, 2014). doi:10.1117/1.JBO.19.5.051211
History: Received August 2, 2013; Revised December 21, 2013; Accepted December 26, 2013
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Abstract.  Micro- and nano-fabrication methods facilitate the use of nanostructures for the separation of collections of particles and nanobio-based optical and electrochemical sensing. We have presented an easy and simple nanopore size reduction method of a low-stressed silicon nitride (SiN) membrane nanosieve (100×100μm2) using a nanoimprinting method based on a natural thermal reflow of the contact imprinting polymer, possibly maintaining compatibility with complementary metal-oxide semiconductor integrated circuit processes. The nanopore pattern size of this nanosieve membrane was precisely patterned by a nanoimprinting process using an electron beam patterned silicon master, to about 30-nm diameter. By employing mainly an electron beam resist reflow phenomena after a nanoimprinting process and anisotropic reactive ion etch, the etch holes’ size was fabricated to be the same with nanopatterns on the polymer. The contact imprinting master can be used continually for the generation of nanopore patterns simply and easily. It can endure harsh conditions like high temperature up to 800°C, and it is inert to many aggressive and strong chemicals. Also, this would be a low-cost, simple, and easy fabrication method for the precise and reliable size-reduction control of nanopores for mass production of nanobio sensors or chips.

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© 2014 Society of Photo-Optical Instrumentation Engineers

Citation

Dae-Sik Lee ; Hyun-Woo Song ; Choon-Gi Choi and Mun Youn Jung
"Pore-size reduction protocol for SiN membrane nanopore using the thermal reflow in nanoimprinting for nanobio-based sensing", J. Biomed. Opt. 19(5), 051211 (Feb 06, 2014). ; http://dx.doi.org/10.1117/1.JBO.19.5.051211


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