Poster
30 April 2023 Reflective deep-ultraviolet Fourier ptychographic microscopy for nanoscale imaging
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Conference Poster
Abstract
We present a reflective Fourier ptychographic microscopy (FPM) with a deep ultraviolet (DUV) laser and a high numerical aperture objective for sub-100nm imaging of an opaque target used in semiconductor device manufacturing. An aperture scanning illumination system designed for a laser with high energy fluence is implemented for angle-varied illumination. Performance of the DUV FPM is evaluated and compared to conventional DUV microscopy by imaging a series of molybdenum silicide (MoSi) multiline with a minimum linewidth of 80 nm, showing that contrast enhancement ratio increases as the linewidth of the target decreases.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Kwan Seob Park, Yoon Sung Bae, Sang-Soo Choi, and Martin Y. Sohn "Reflective deep-ultraviolet Fourier ptychographic microscopy for nanoscale imaging", Proc. SPIE 12496, Metrology, Inspection, and Process Control XXXVII, 124963L (30 April 2023); https://doi.org/10.1117/12.2666132
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