Presentation + Paper
8 March 2024 Development and optimization of CMOS-compatible AlN-based photonic devices for 1.55 µm applications: fabrication, characterization, and potential for integrated optics
Author Affiliations +
Abstract
This study presents the development and optimization of AlN-based optical waveguides and photonic devices for 1.55 μm applications, utilizing a CMOS-compatible sputtered thin film technology. The fabrication employs a two-step photoresist technique to fabricate AlN core waveguides with low propagation losses and other optical devices, such as a 1×2 multimode interference (MMI) coupler, Mach-Zehnder interferometers and ring resonators. The results of this study highlight the potential for efficient and cost-effective fabrication of AlN-based integrated optical circuits and pave the way for further research and development in the field of integrated optics.
Conference Presentation
(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.
R. Amrar, G. Beaudin, G. Droulers, S. Loquai, and P. G. Charette "Development and optimization of CMOS-compatible AlN-based photonic devices for 1.55 µm applications: fabrication, characterization, and potential for integrated optics", Proc. SPIE 12890, Smart Photonic and Optoelectronic Integrated Circuits 2024, 1289007 (8 March 2024); https://doi.org/10.1117/12.2692237
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Aluminum nitride

Fabrication

Waveguides

Photonic devices

Integrated optics

Optical resonators

Microresonators

Back to Top