Exploring EUV scanner design options enabled by free electron laser sources

Thomas V. Pistor

doi:10.1117/12.3012410

10 April 2024 Exploring EUV scanner design options enabled by free electron laser sources

Thomas V. Pistor

Proceedings Volume 12953, Optical and EUV Nanolithography XXXVII; 129530U (2024) https://doi.org/10.1117/12.3012410
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Abstract

An accelerator-based free electron laser (FEL) source of 13.5nm light can, among other benefits, provide more power, polarized light and no out-of-band radiation. This paper explores how the extra power, polarized light and lack of out-of-band radiation could be used in future scanner designs. The differences between light generated from a laser-produced plasma (LPP) source and an FEL source are discussed. Rigorous mask simulation, OPC and source optimization are used to assess the impacts of polarization on contrast and process window for lines/spaces and multiple 2D patterns. Polarization is shown to provide contrast and process window benefits at half-pitches below 8nm. A full-field, isomorphic, 0.55NA scanner design is considered as a case study showcasing the benefits of FEL-based EUV light sources.

Conference Presentation

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Thomas V. Pistor "Exploring EUV scanner design options enabled by free electron laser sources", Proc. SPIE 12953, Optical and EUV Nanolithography XXXVII, 129530U (10 April 2024); https://doi.org/10.1117/12.3012410

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