Paper
2 September 1997 Engineering tool set for monolithic and hybrid microsystem design
H. Boutamine, Jean Michel Karam, Bernard Courtois, P. Drake, J. Oudinot, H. El Tahawi, Ariel D. Cao, Marta Rencz, Andras Poppe, Vladimir Szekely
Author Affiliations +
Proceedings Volume 3225, Microlithography and Metrology in Micromachining III; (1997) https://doi.org/10.1117/12.284556
Event: Micromachining and Microfabrication, 1997, Austin, TX, United States
Abstract
In this paper, we report on the recent advances in building an integrated environment for the design and simulation of microsystems based on commercially available CAD tools. The environment allows a continuous design flow from front-end to back-end for both monolithic and hybrid microsystems. Based on the FEM simulation results in a pre-design phase, simulation models of available standard components are developed in a system level and coupled to layout generators. A multi-level, mixed-mode, multi-technology simulation is ensured and a schematic driven layout is generated. Tools for anisotropic etching simulation are integrated in order to predict the etching procedure of full-custom microstructures.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
H. Boutamine, Jean Michel Karam, Bernard Courtois, P. Drake, J. Oudinot, H. El Tahawi, Ariel D. Cao, Marta Rencz, Andras Poppe, and Vladimir Szekely "Engineering tool set for monolithic and hybrid microsystem design", Proc. SPIE 3225, Microlithography and Metrology in Micromachining III, (2 September 1997); https://doi.org/10.1117/12.284556
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KEYWORDS
Computer aided design

Microsystems

Anisotropic etching

Standards development

Etching

Finite element methods

Solid modeling

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