Photochemical selective surface modification using micromirror array for biochip fabrication

Kook-Nyung Lee; Dong-Sik Shin; Woo-Jae Chung; Yoon-Sik Lee; Yong-Kweon Kim

doi:10.1117/12.442965

28 September 2001 Photochemical selective surface modification using micromirror array for biochip fabrication

Kook-Nyung Lee, Dong-Sik Shin, Woo-Jae Chung, Yoon-Sik Lee, Yong-Kweon Kim

Proceedings Volume 4557, Micromachining and Microfabrication Process Technology VII; (2001) https://doi.org/10.1117/12.442965
Event: Micromachining and Microfabrication, 2001, San Francisco, CA, United States

Abstract

Two dimensional micromirror array(MMA) is designed and fabricated to be used as a spatial light modulator for biochip fabrication. The optical projection system is setup using the MMA for maskless photolithography process, which is applied to photochemical surface modification. The photoresist (AZ1512) pattern is fabricated by the MMA projection in the maskless photolithography system, which consists of MMA and other optical components like projection lens. The patterned PR on a chip substrate is analyzed to improve pattern edge definition. The parameters of the optical system, which are lens location, incident angle of the UV light and the MMA location, are adjusted to obtain fine pattern edge definition by the MMA deflection. To immobilize proteins on the specific surface regions of a chip substrate to make protein patterning, nitroveratryloxycarbonyl(NVOC) group is used as a photolabile protecting group. The surface which is protected by NVOC group, is selectively irradiated by UV illuminator using the MMA. After removing the NVOC group, FITC(fluorescein isothianade) is tagged to the NVOC-cleaved site to find out the photo-cleavage condition of NOVC group by UV irradiation in the maskless photolithography system. Using the photocleavage condition, biotin was coupled to the NVOC-cleaved site. Then, we could obtain streptavidin-patterned surface.

Citation Download Citation

Kook-Nyung Lee, Dong-Sik Shin, Woo-Jae Chung, Yoon-Sik Lee, and Yong-Kweon Kim "Photochemical selective surface modification using micromirror array for biochip fabrication", Proc. SPIE 4557, Micromachining and Microfabrication Process Technology VII, (28 September 2001); https://doi.org/10.1117/12.442965

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available

Members: $17.00

Non-members: $21.00 ADD TO CART

PROCEEDINGS
8 PAGES

DOWNLOAD PAPER SAVE TO MY LIBRARY

GET CITATION

RIGHTS & PERMISSIONS

Get copyright permission Get copyright permission on Copyright Marketplace

KEYWORDS

Proteins

Optical lithography

Micromirrors

Ultraviolet radiation

Glasses

Bandpass filters

Luminescence

Show All Keywords

Keywords/Phrases

Search In:

Publication Years