Mr. Ian J. Doohan Profile

Ian J. Doohan

Principal Process Engineer at Texas Instruments Inc

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 20 April 2001 Paper

20-um deep trench isolation process characterization for linear bipolar ICs

Terry Dyer, Ian Doohan, Martin Fallon, Dave McAlpine, Adam Aitkenhead, Jim McGinty, M. Taylor, Philip Gravelle, A. Schouten, M. Bryce

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425246

KEYWORDS: Transistors, Photomasks, Oxides, Silicon, Semiconducting wafers, Diffusion, Composites, Dielectrics, Etching, Semiconductors

Read Abstract +

Proceedings Article | 20 April 2001 Paper

Etch selectivity of a wet chemical formulation for premetal cleaning

Jeremy Epton, Deborah Jarrett, Ian Doohan

Proceedings Volume 4405, (2001) https://doi.org/10.1117/12.425245

KEYWORDS: Etching, Oxides, Silica, Semiconducting wafers, Hydrogen, HF etching, Metals, Manufacturing, Wet etching, Chemical reactions

Read Abstract +

Proceedings Article | 23 April 1999 Paper

Dry etch uniformity and optimization using graphical and DOE techniques

John Doohan, Martin Fallon, I. Thomson, Richard Boyle, J. Norval

Proceedings Volume 3742, (1999) https://doi.org/10.1117/12.346241

KEYWORDS: Semiconducting wafers, Etching, Oxides, Plasma etching, Statistical analysis, Dry etching, Visualization, Helium, Diffractive optical elements, Manufacturing

Read Abstract +

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years