Prof. Uriel Levy Profile

Prof. Uriel Levy

Head of the Nanophotonic and Optofluidic Lab at Hebrew Univ of Jerusalem

SPIE Involvement:

Conference Program Committee | Author

Publications (23)

Proceedings Article | 11 June 2024 Presentation

Flat lenses under polychromatic illumination: what can and what cannot be achieved

Jacob Engelberg, Noa Mazurski, Eitan Mualem, Roy Maman, Uriel Levy

Proceedings Volume PC12990, PC129900T (2024) https://doi.org/10.1117/12.3022873

KEYWORDS: Metalenses, Computational imaging

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Proceedings Article | 6 June 2024 Poster

CMOS-compatible electro-optical SRAM cavity device based on negative differential resistance

Rivka Gherabli, Roy Zektzer, Meir Grajower, Joseph Shappir, Christian Frydendahl, Uriel Levy

Proceedings Volume 13012, 130120W (2024) https://doi.org/10.1117/12.3029908

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Proceedings Article | 13 March 2024 Presentation

Advanced configurations for light-vapour interactions at the nanoscale

Uriel Levy

Proceedings Volume PC12912, PC129123Q (2024) https://doi.org/10.1117/12.3012162

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Proceedings Article | 8 March 2024 Presentation + Paper

Optical simulation of laser-induced tunnel ionization based on a curved waveguide

Arnon Ben Levy, Amir Hen, Merav Kahn, Yoad Aharon, Noa Mazurski, Uriel Levy, Gilad Marcus

Proceedings Volume 12884, 128840H (2024) https://doi.org/10.1117/12.3009316

KEYWORDS: Ionization, Waveguides, Electrons, Quantum tunneling, Quantum simulation, Quantum processes, Optical simulations, Quantum physics, Quantum amplitude

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Proceedings Article | 5 October 2023 Presentation

New materials and fabrication platforms for metasurfaces

Uriel Levy, Oren Goldberg, Noa Mazurski, Jacob Engelberg

Proceedings Volume PC12648, PC126480T (2023) https://doi.org/10.1117/12.2680305

KEYWORDS: Materials processing, Fabrication, Dielectrics

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Proceedings Article | 4 October 2023 Presentation

Active and tunable metasurfaces

Zhengli Han, Christian Frydendahl, Stia Ram Indukuri, Noa Mazurski, Uriel Levy, Aharon Weiss

Proceedings Volume PC12646, PC126460K (2023) https://doi.org/10.1117/12.2680299

KEYWORDS: Microelectromechanical systems, Lithium niobate, Electro optics, Dielectrics

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Proceedings Article | 9 March 2023 Presentation

Advanced topics in chip scale vapor cells

Uriel Levy

Proceedings Volume PC12447, PC124472T (2023) https://doi.org/10.1117/12.2657168

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Proceedings Article | 18 September 2018 Presentation

Nano-scale laser printing optical metasurfaces (Conference Presentation)

Anders Kristensen, Xiaolong Zhu, Airidas Zukauskas, Søren Raza, Mehdi Hedayati, Chen Zhou, Levy Uriel, N. Asger Mortensen

Proceedings Volume 10731, 107310H (2018) https://doi.org/10.1117/12.2320969

KEYWORDS: Optics manufacturing, Laser optics, Nonimpact printing, Printing, Dielectrics, Digital holography, Optical signal processing, Holography, Surface plasmons, Thin film deposition

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This paper describes digital printing of optical metasurfaces for ink-free colour decoration and flat optics, by holographic laser post-writing on nano-textured, metal-coated optical metasurfaces. Our optical metasurfaces are based on the concepts of both localized surface plasmon resonances (LSPR) and high-index dielectrics compatible with technologies for high volume manufactured plastic products. The optical metasurfaces are formed by nanoimprinting a surface texture comprising nanoscale cylinders. By subsequent deposition of a thin film of metal or high index dielectric, isolated nano-discs are formed on top of the cylinders, while a continuous film is formed on the substrate surface in between the cylinders. The nano-scale disks and corresponding holes in the continuous film form optical resonators. The master-original for the square-centimeter nano-texture is realized by means fast e-beam writing. The nanotextured plasmonic metasurface may be covered with a transparent protective coating, which can withstand the daily life handling. Laser post-writing can modify disks and holes, and hence the optical resonances. Laser pulses induce transient local heat generation that leads to melting and reshaping of the imprinted nanostructures. This enables flexible definition and alignment of optical components on high volume manufactured plastic products. Our approach offers a printing speed of 1 ns per pixel (in raster scan), resolution up to 127,000 dots per inch (DPI) and power consumption down to 0.3 nJ per pixel. References J. S.Clausen et al., Nano Letters, 14, 4499-4504, (2014). A. Kristensen et al., Nature Reviews Materials 2,16088, (2016). X. Zhu et al., Science Advances, 3(5), e1602487, (2017). E. Højlund-Nielsen et al., Adv. Mater. Technol., 1600054, (2016). E. Højlund-Nielsen et al., Microelectronic Engineering, 121, 104-107, (2014). X. Zhu et al., Nature Nanotechnology, 11, 325-329, (2016). M. S. Carstensen et al., ACS Photonics, in press (2018).

Proceedings Article | 23 May 2018 Presentation

An optofluidic sensor for point-of-care whole blood hemolysis detection (Conference Presentation)

Chen Zhou, Mehdi Hedayati, Xiaolong Zhu, Frank Nielsen, Uriel Levy, Anders Kristensen

Proceedings Volume 10680, 106800V (2018) https://doi.org/10.1117/12.2306211

KEYWORDS: Blood, Sensors, Point-of-care devices, Optofluidics, Plasma, Waveguides, Absorption, Optical fabrication, Polymeric sensors, Polymers

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Hemolysis is the rupture of the red blood cells (RBCs) with consequent release of hemoglobin to the blood plasma. To detect hemolysis, the red blood cells have to be separated from the blood plasma. Current clinical methods require centrifugation steps for cell/plasma separation, which is time consuming and not suitable for integration into Point-of-Care (PoC) devices. The lack of a fast and reliable PoC hemolysis detection is a central cause of hemolysis being the largest source of unsuitable samples received in clinical laboratories worldwide. Here, we present an optofluidic approach to address this issue. To measure the free hemoglobin in plasma of whole blood, evanescent waveguide absorption is accomplished in wavelength range of 400-430 nm, where hemoglobin has the strongest absorption. For separation of the RBCs, nano-filters are imprinted on top of the waveguide, enabling local blocking of RBCs from the evanescent field region. By this means, our sensor is able to accomplish hemolysis detection on whole blood without any need of sample preparation such as centrifugation. Various nano-imprint techniques are employed to define the gratings couplers (368 nm pitch) and nano-filters(400 nm pitch). The sensor is fabricated on a flexible polymer membrane, enabling easy integration. The nano-imprint fabrication used here allows easy up-scaling for industrial adaption. Furthermore, we use gratings couplers to disperse the guided broadband light and accomplish spectral analysis with a linear camera, which enables highly compact optical setup. We tested the hemolysis sensor integrated in a modified commercial PoC blood gas analyzer. Whole blood and plasma with different free hemoglobin concentrations are tested, proving the filtering ability of the sensor. Detecting interference from other blood proteins such as bilirubin is successfully demonstrated by spectral analysis algorithm. Long-term tests for more than a month further show its high repeatability, specificity, and reliability. We envision large potential in improving PoC blood diagnostic quality by our sensor as well as further applications in optical detection in turbid media.

Proceedings Article | 14 March 2018 Presentation

Digital laser printing at the nanoscale (Conference Presentation)

Anders Kristensen, Xiaolong Zhu, Mehdi Hedayati, Søren Raza, Uriel Levi, N. Asger Mortensen

Proceedings Volume 10519, 105190I (2018) https://doi.org/10.1117/12.2295303

KEYWORDS: Nonimpact printing, Digital holography, Printing, Holography, Spatial light modulators, High power lasers, Absorption, Optical components, Zone plates, Axicons

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Proceedings Article | 24 February 2009 Paper

Shallow Fresnel lens fabrication using grayscale lithography made by high energy beam sensitive mask (HEBS) technology and reactive ion etching

Tali Nachmias, Avi Ohayon, Shefer Meltzer, Meni Kabla, Elie Louzon, Uriel Levy

Proceedings Volume 7205, 72050B (2009) https://doi.org/10.1117/12.809376

KEYWORDS: Fresnel lenses, Photoresist materials, Etching, Silicon, Reactive ion etching, Deep reactive ion etching, Electrodes, Oxygen, Lithography, Plasma

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Proceedings Article | 6 February 2008 Paper

Metamaterials for free space on a chip applications

Uriel Levy, Maxim Abashin, Kazuhiro Ikeda, Yeshaiahu Fainman

Proceedings Volume 6883, 688307 (2008) https://doi.org/10.1117/12.768148

KEYWORDS: Refractive index, Waveguides, Free space, Geometrical optics, Silicon, Near field optics, Light wave propagation, Metamaterials, Nanophotonics, Near field scanning optical microscopy

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Proceedings Article | 14 February 2007 Paper

Nanophotonics for information systems

M. Nezhad, M. Abashin, K. Ikeda, L. Pang, H. Kim, U. Levy, K. Tetz, R. Rokitski, Y. Fainman

Proceedings Volume 6476, 64760A (2007) https://doi.org/10.1117/12.711695

KEYWORDS: Polarization, Reflectivity, Chemical elements, Near field optics, Birefringence, Diffraction, Reflection, Integrated optics, Dielectric polarization, Refractive index

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Proceedings Article | 3 March 2006 Paper

Nanophotonics for integrated information systems

Uriel Levy, Kevin Tetz, Rostislav Rokitski, Hyu-Chang Kim, Chia-Ho Tsai, Maxim Abashin, Lin Pang, Maziar Zezhad, Yeshaiahu Fainman

Proceedings Volume 6124, 612404 (2006) https://doi.org/10.1117/12.655704

KEYWORDS: Polarization, Near field, Near field optics, Nanophotonics, Chemical elements, Integrated optics, Dielectric polarization, Waveguides, Photonic crystals, Geometrical optics

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Proceedings Article | 22 January 2005 Paper

Characterization of chemically assisted ion beam etching and form birefringence structure fabrication in GaAs using SU-8

Lin Pang, Maziar Nezhad, Uriel Levy, Chiaho Tsai, Yeshaiahu Fainman

Proceedings Volume 5720, (2005) https://doi.org/10.1117/12.590564

KEYWORDS: Etching, Chlorine, Gallium arsenide, Ion beams, Photomasks, Holography, Lithography, Dry etching, Argon, Birefringence

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Proceedings Article | 8 October 2004 Paper

Fabrication and characterization of GaAs-based space-variant inhomogeneous media for polarization control at 10.6 µm

Chia-Ho Tsai, Uriel Levy, Lin Pang, Shaya Fainman

Proceedings Volume 5515, (2004) https://doi.org/10.1117/12.560648

KEYWORDS: Polarization, Etching, Chemical elements, Ion beams, Gallium arsenide, Birefringence, Phase shifts, Antireflective coatings, Infrared cameras, Dry etching

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Proceedings Article | 6 July 2004 Paper

Nanophotonics: materials and devices

Uriel Levy, Chia-Ho Tsai, M. Nezhad, Wataru Nakagawa, C.-H. Chen, Kevin Tetz, L. Pang, Yeshaiahu Fainman

Proceedings Volume 5359, (2004) https://doi.org/10.1117/12.516209

KEYWORDS: Polarization, Dispersion, Nanostructures, Reflectivity, Near field optics, Refractive index, Chemical elements, Gallium arsenide, Birefringence, Diffraction

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Proceedings Article | 3 September 2002 Paper

Evolution of ultrafast all-optical free-space switches

Zeev Zalevsky, Gal Shabtay, David Mendlovic, Amir Shemer, Vardit Eckhouse, Roy Appelman, Uriel Levy

Proceedings Volume 4907, (2002) https://doi.org/10.1117/12.482257

KEYWORDS: Switching, Switches, Polarization, Ultrafast phenomena, Prototyping, Optical switching, Optical networks, Dielectric polarization, Transmitters, Optical amplifiers

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SPIE Journal Paper | 1 June 2002

Novel denoising algorithm for obtaining a super resolved position estimation

Zeev Zalevsky, Yoav Shrot, Uriel Levy, David Mendelovic

OE, Vol. 41, Issue 06, (June 2002) https://doi.org/10.1117/12.10.1117/1.1476938

KEYWORDS: Error analysis, Denoising, Interference (communication), Detection and tracking algorithms, Charge-coupled devices, Optical engineering, Light emitting diodes, Statistical analysis, Optical tracking, Algorithms

Proceedings Article | 6 July 2001 Paper

From computer-generated holograms toward partially coherent optical signal processors

David Mendlovic, Gal Shabtay, Zeev Zalevsky, Emanuel Marom, Uriel Levy, Naim Konforti, Javier Garcia, Efraim Goldenberg

Proceedings Volume 4392, (2001) https://doi.org/10.1117/12.432799

KEYWORDS: Signal processing, Optical signal processing, Spatial coherence, Coherence (optics), Computer generated holography, Data processing, Diffraction, Light sources, Optical spheres, Charge-coupled devices

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Optical signal processing has its roots in the experiments of Lord Rayleigh, Abbe and Porter that were the first that dealt with the spectrum of an image. This historical path of revolution has been followed years later by the extraordinary work of A. W. Lohmann in the optical data processing during the last 40 years. The new innovations and the future possibilities that are to be opened up in the new millennium show his dominant signature. Some recent projects that enlighten the future ofthe optical signal processing field are described in this presentation. The invention of the computer generated holograms (CGH) was a giant leap for the optical signal processing field. Filters and holograms that previously were generated by direct holographic recording means, have been all of a sudden replaced by synthetic functions designed and realized by digital computers. It was the first interface between digital computers and optical systems. Such an approach led to the design of opto-electronic systems that operate in perfect synergy where each element is utilized for what it does best. Along the years, the field of computer-generated holography has been expanded to what is known as: diffractive optical elements. Techniques like kinoforms, binary optics, on-axis CGH, etc. have been developed for addressing the growing application list ofsuch elements. CGHs highly affected the optical signal-processing field. For example, various new processing techniques were created and applied for invariant pattern recognition (Circular Harmonics (CH), Synthetic Discriminate Filters (SDF) etc). The next innovation wave reached the shores of the optical data processing community in the 80s when A. W. Lohmann presented the optical interconnections as the next challenge of optical data processing. Many configurations were discussed, investigated and applied for optical processing (perfect shuffle, omega net, cross over etc.). In the 90s A. W. Lohmann was a key player in a new revolution in optical processing where optics was used as a transformation tool. New transformations were invented and realized by optical means as for instance Fractional Fourier Transform, Wigner distribution, Fractional Hubert and Hartley Transforms etc. Those were applied for various signal-processing applications and used also in digital processing. In the new millenium optics adapts itself to the binary mode of operation that is common in computer systems. This trend becomes feasible also due to the impressive progress in the opto-electrical interface devices such as the spatial light modulators, light sources such as VCSELs and detectors such as photo-diodes. These new achievements permit also the operation of opto-electronic systems at extremely high rates. It is evident that in the next years of the millenium optical data processing field will continue to grow, develop and replace additional processing modules in the digital computation world. Without much doubt those will be accompanied and innovated by the scientific assistance foundation and guidance of A. W. Lohmann. In this paper we will focus on optical processing of partially coherent light. This field is mostly interesting and relevant since it includes both the aspects of data processing and the optical design skills that insure its promising industrial future.

Proceedings Article | 29 June 2001 Paper

Efficiency analysis of periodic diffractive optical elements: suitability of various approaches

Uriel Levy, Emanuel Marom, David Mendlovic

Proceedings Volume 4430, (2001) https://doi.org/10.1117/12.432822

KEYWORDS: Diffraction, Diffraction gratings, Chemical elements, Phase modulation, Diffractive optical elements, Optical components, Optics manufacturing, Dielectrics, Phase shift keying, Binary data

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Proceedings Article | 19 July 1999 Paper

Optimal 3D beam forming

Gal Shabtay, Uriel Levy, David Mendlovic, Zeev Zalevsky, Emanuel Marom

Proceedings Volume 3749, (1999) https://doi.org/10.1117/12.355023

KEYWORDS: Gaussian beams, Diffraction, Optical components, Fourier transforms, Beam propagation method, Free space, Calculus, Wave propagation, Wavefronts, Optical communications

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Proceedings Article | 9 March 1999 Paper

Novel system for obtaining real-time 3D position superresolved estimation of point targets

David Mendlovic, Zeev Zalevsky, Uriel Levy, Gal Shabtay, Naim Konforti, Emanuel Marom

Proceedings Volume 3715, (1999) https://doi.org/10.1117/12.341302

KEYWORDS: 3D acquisition, Detector arrays, Quantization, Diffractive optical elements, Detection and tracking algorithms, Error analysis, Spatial resolution, Imaging systems, Optical components, Cameras

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Showing 5 of 23 publications

Conference Committee Involvement (36)

Quantum Sensing, Imaging, and Precision Metrology III

25 January 2025 | San Francisco, California, United States

Ultrafast Phenomena and Nanophotonics XXIX

25 January 2025 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2024

18 August 2024 | San Diego, California, United States

Ultrafast Phenomena and Nanophotonics XXVIII

29 January 2024 | San Francisco, California, United States

Quantum Sensing, Imaging, and Precision Metrology II

27 January 2024 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2023

20 August 2023 | San Diego, California, United States

Quantum Sensing, Imaging, and Precision Metrology

28 January 2023 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2022

21 August 2022 | San Diego, California, United States

Optical and Quantum Sensing and Precision Metrology II

22 January 2022 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2021

1 August 2021 | San Diego, California, United States

Optical and Quantum Sensing and Precision Metrology

6 March 2021 | Online Only, California, United States

Metamaterials, Metadevices, and Metasystems 2020

24 August 2020 | Online Only, California, United States

Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology II

1 February 2020 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2019

11 August 2019 | San Diego, California, United States

Optical, Opto-Atomic, and Entanglement-Enhanced Precision Metrology

2 February 2019 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2018

19 August 2018 | San Diego, California, United States

Metamaterials

23 April 2018 | Strasbourg, France

Steep Dispersion Engineering and Opto-Atomic Precision Metrology XI

29 January 2018 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2017

6 August 2017 | San Diego, California, United States

Slow Light, Fast Light, and Opto-Atomic Precision Metrology X

30 January 2017 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2016

28 August 2016 | San Diego, California, United States

Slow Light, Fast Light, and Opto-Atomic Precision Metrology IX

15 February 2016 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2015

9 August 2015 | San Diego, California, United States

Slow Light, Fast Light, and Opto-Atomic Precision Metrology VIII

8 February 2015 | San Francisco, California, United States

Metamaterials, Metadevices, and Metasystems 2014

17 August 2014 | San Diego, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VII

3 February 2014 | San Francisco, California, United States

Advances in Slow and Fast Light VII

2 February 2014 | San Francisco, California, United States

Metamaterials: Fundamentals and Applications VI

25 August 2013 | San Diego, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics VI

5 February 2013 | San Francisco, California, United States

Advances in Slow and Fast Light VI

3 February 2013 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics V

24 January 2012 | San Francisco, California, United States

Advances in Slow and Fast Light V

22 January 2012 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics IV

25 January 2011 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics III

25 January 2010 | San Francisco, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics II

26 January 2009 | San Jose, California, United States

Advanced Fabrication Technologies for Micro/Nano Optics and Photonics

21 January 2008 | San Jose, California, United States

Showing 5 of 36 Conference Committees

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