PROCEEDINGS VOLUME 1671
MICROLITHOGRAPHY '92 | 8-12 MARCH 1992
Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II
Editor(s): Martin C. Peckerar
Editor Affiliations +
IN THIS VOLUME

4 Sessions, 45 Papers, 0 Presentations, 0 Posters
MICROLITHOGRAPHY '92
8-12 March 1992
San Jose, CA, United States
E-Beam Lithography
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136006
Frank E. Abboud, John T. Poreda, Robert L. Smith
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136007
Warren W. Flack, David H. Dameron, Valerie J. Alameda, Ghassan C. Malek
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136008
Takashi Matsuzaka, Hiroya Ohta, Norio Saitou, Katsuhiro Kawasaki, Kazumitsu Nakamura, Toshihiko Kohno, Morihisa Hoga
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136009
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136010
Yuhey Lee, Raymond Browning, Roger Fabian W. Pease
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136011
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136012
Recent Developments in X-Ray Lithography
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136013
L. Grant Lesoine, Kenneth W. Kukkonen, Jeffrey A. Leavey
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136014
George K. Celler, John Frackoviak, Richard R. Freeman, Charles W. Jurgensen, R. R. Kola, Anthony E. Novembre, Larry F. Thompson, Lee E. Trimble, David N. Tomes
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136015
Lee E. Trimble, George K. Celler, John Frackoviak, James Alexander Liddle, Gary R. Weber
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136016
James M. Oberschmidt, Robert P. Rippstein, Raymond R. Ruckel, Alek C. Chen, John C. Granlund, Alfred E. Palumbo
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136017
Argyrios Doumas, Stephen Kovacs
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136018
Eric A. Haytcher, Roxann L. Engelstad, N. M. Schnurr
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136019
E-Beam Lithography
James S. Sewell, Christopher A. Bozada, Mercy H. Styrcula, William E. Davis, Ross W. Dettmer, Robert A. Neidhart
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136020
Takeo Nagata, Masahiro Kobayashi, Kinjiro Kosemura, Masami Satoh, Moritoshi Ando, Toshihiko Miyashita, O. Ikata
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136021
Torgil Kjellberg, Richard Schatz, Stefan Nilsson, Bjoern Broberg
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136022
Gary W. Jones, Ching T. Sune, Susan K. Jones, Henry F. Gray
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136023
Chih-Yuan Chang, Gerry Owen, Roger Fabian W. Pease, Thomas Kailath
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136024
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136025
Recent Developments in X-Ray Lithography
Daniel L. Laird, Roxann L. Engelstad
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136026
Robert Fedosejevs, Romuald Bobkowski, James N. Broughton, B. Harwood
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136027
Shridar Aithal, Kenji Kawai, M. Lamari, Emilio Panarella
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136028
Kouichi Hara, Tohru Itoh
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136029
Resists for Manufacturing
Sergey V. Babin, Ivan Kostic, A. A. Svintsov
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136030
Focused-Ion-Beam Processing
Lloyd R. Harriott, Joseph G. Garofalo, Robert L. Kostelak
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136031
Diane K. Stewart, Michael J. Vasile
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136032
Michael J. Vasile
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136033
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136034
Ulrich A. Jagdhold, Wolfgang Pilz, L. M. Buchmann, M. Torkler
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136035
Jay A. Skidmore, Guy D. Spiers, John H. English, Zheng Xu, Craig B. Prater, Larry A. Coldren, Evelyn L. Hu, Pierre M. Petroff
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136036
Resists for Manufacturing
Whitson G. Waldo, Ahmad D. Katnani, Harbans S. Sachdev
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136037
Gilles R. Amblard, Laurent A. Guerin, Frederic P. Lalanne, Jean-Pierre Panabiere, Michel E. Guillaume, Philippe Romand, Andre P. Weill
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136038
Eytan Barouch, Uwe Hollerbach, Steven A. Orszag, Martin C. Peckerar, Milton Rebbert
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136039
Steven J. Holmes, Albert S. Bergendahl, Diana D. Dunn, J. Guidry, Mark C. Hakey, Karey L. Holland, Andy Horr, Dean C. Humphrey, Stephen E. Knight, et al.
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136040
Akihiro Usujima, Ryuji Tazume, Tatsuji Araya, Yoshimi Shioya, Kazumasa Shigematsu
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136041
Recent Developments in X-Ray Lithography
F. Gabeli, Hans L. Huber, A. Kucinski, H.-U. Scheunemann, Klaus Simon, Elmar Cullmann
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136042
Hyung Joun Yoo
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136043
Brian Emerson Newnam, Vriddhachalam K. Viswanathan
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136044
Vriddhachalam K. Viswanathan
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136045
Franco Cerrina, Jerry Z.Y. Guo
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136046
F. Baszler, Mumit Khan, Franco Cerrina
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136047
Richard K. Cole III, Paul D. Anderson, Gregory M. Wells, Eric Brodsky, Kuniaki Yamazaki, Franco Cerrina
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136048
Guan-Jye Chen, D. Bodoh, John P. Wallace, Paul D. Anderson, Michael T. Reilly, Ramez Nachman, Franco Cerrina
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136049
Linda Milor
Proceedings Volume Electron-Beam, X-Ray, and Ion-Beam Submicrometer Lithographies for Manufacturing II, (1992) https://doi.org/10.1117/12.136050
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