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The advent of 300mm fabrication tools and immersion lithography for photonics may change the game and the practical use of ring resonator based devices. We implemented such ring resonators on our 300 mm SOI platform for Silicon photonics using immersion lithography. We show that such technology offers unprecedented level of uniformity and reproducibility within a die but also from die to die. Such performances allowed us to combine and cascade ring resonators to fabricate high rejection filters in Coupled Resonator Optical Waveguide (CROW) configurations. Such high rejection filters are thus very promising candidates for quantum photonics, and more particularly in circuits based on photons pair generation, where pump rejection filters with over 100dB of rejection are needed.
Léopold Virot,Annalara Ferrara,Quentin Wilmart,Mattéo Galli,Daniele Bajoni, andSégolène Olivier
"High rejection filters based on cascaded ring resonators in a 300 mm silicon photonics platform", Proc. SPIE PC12426, Silicon Photonics XVIII, PC124260C (13 March 2023); https://doi.org/10.1117/12.2646814
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Léopold Virot, Annalara Ferrara, Quentin Wilmart, Mattéo Galli, Daniele Bajoni, Ségolène Olivier, "High rejection filters based on cascaded ring resonators in a 300 mm silicon photonics platform," Proc. SPIE PC12426, Silicon Photonics XVIII, PC124260C (13 March 2023); https://doi.org/10.1117/12.2646814