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22 November 2023 Modelling reactions in ESCAP polymers following EUV exposure via a chemical reaction network
Jacob R. Milton, Frances A. Houle, Samuel M. Blau
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Proceedings Volume PC12750, International Conference on Extreme Ultraviolet Lithography 2023; PC1275009 (2023) https://doi.org/10.1117/12.2687731
Event: SPIE Photomask Technology + EUV Lithography, 2023, Monterey, California, United States
Abstract
To better control stochastics related to chemical reactivity in CARs, our goal is to develop a model that captures the thermodynamics and kinetics of ionization and reactions that occur in an ESCAP photoresist upon exposure to EUV light. To this end, we have used high-throughput density functional theory workflows to generate a chemical reaction network to describe photoionization and electron ionization as well as downstream reactions likely to occur upon EUV exposure and post-exposure bake of a random copolymer of poly(hydroxystyrene) and poly(methylmethacrylate), triphenylsulfonium nonaflate, and triphenylsulfonium cyanobenzoate. This work details the generation of the reaction network, efforts to refine it by removing kinetically infeasible reactions, and important reactions predicted by the network. Further, we describe initial work to use this reaction network to generate 3D kinetic models.
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Jacob R. Milton, Frances A. Houle, and Samuel M. Blau "Modelling reactions in ESCAP polymers following EUV exposure via a chemical reaction network", Proc. SPIE PC12750, International Conference on Extreme Ultraviolet Lithography 2023, PC1275009 (22 November 2023); https://doi.org/10.1117/12.2687731
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KEYWORDS
Extreme ultraviolet lithography
Chemical reactions
Modeling
Polymers
3D modeling
Ionization
Photoresist materials
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