Recent Developments In Reactively Sputtered Optical Thin Films

W. T. Pawlewicz; P. M. Martin; D. D. Hays; I. B. Mann

doi:10.1117/12.933293

29 April 1982 Recent Developments In Reactively Sputtered Optical Thin Films

W. T. Pawlewicz, P. M. Martin, D. D. Hays, I. B. Mann

Proceedings Volume 0325, Optical Thin Films; (1982) https://doi.org/10.1117/12.933293
Event: 1982 Los Angeles Technical Symposium, 1982, Los Angeles, United States

Abstract

Highlights of a multiyear effort to develop new or improved thin-film, optical-coating materials through the use of reactive sputtering techniques are presented. Reactive sputtering is shown to be an extremely versatile technique capable of straightforward synthesis of broad classes of materials. The exceptional utility of sputtering for preparation of hard coatings such as oxides, nitrides and novel materials based on Si and Ge is described. Some of these coating materials cannot be made by conventional evaporative techniques. Reactive sputtering allows precise control of coating composition, microstructure and the resulting optical properties. Supporting data are presented for TiO2, for which record high damage thresholds were obtained, and for Si-based coatings, for which record low infrared absorptance was achieved. Transparent conductive indium tin oxide (ITO) coatings with low sheet resistance and high visible and near infrared transmission can also be made. These coatings have many electro-optic contact and electromagnetic shielding applications. Examples of multilayer coatings such as all-dielectric and dielectric-enhanced mirrors made from reactively sputtered materials are included, and simple yet elegant fabrication techniques are introduced. The reactive sputtering technique and equipment used specifically for optical coatings are briefly described, and comparison is made with the conventional evaporative approach.

Citation Download Citation

W. T. Pawlewicz, P. M. Martin, D. D. Hays, and I. B. Mann "Recent Developments In Reactively Sputtered Optical Thin Films", Proc. SPIE 0325, Optical Thin Films, (29 April 1982); https://doi.org/10.1117/12.933293

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available