Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation

Kozo Mochiji; Takeshi Kimura; Hidehito Obayashi; Hideki Maezawa

doi:10.1117/12.947815

18 April 1985 Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation

Kozo Mochiji, Takeshi Kimura, Hidehito Obayashi, Hideki Maezawa

Proceedings Volume 0539, Advances in Resist Technology and Processing II; (1985) https://doi.org/10.1117/12.947815
Event: 1985 Microlithography Conferences, 1985, Santa Clara, United States

Abstract

Soft X-ray absorption spectra and spectral sensitivity of X-ray resist are studied using synchrotron radiation. A measurement technique for spectral sensitivity named X-ray Excited Ion Mass Analysis is newly developed. Spectral sensitivity is evaluated from the fragment yield of the decomposed resist during exposure to monochromatized synchrotron radiation. Using this technique, the spectral sensitivity of poly-2-methylpentene-1-sulfone is measured. The sensitivity is found to be enhanced at shorter wavelengths despite a low absorption coefficient.

Citation Download Citation

Kozo Mochiji, Takeshi Kimura, Hidehito Obayashi, and Hideki Maezawa "Soft X-Ray Spectral Characterization Of Resist Using Synchrotron Radiation", Proc. SPIE 0539, Advances in Resist Technology and Processing II, (18 April 1985); https://doi.org/10.1117/12.947815

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