Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System

M. A. v. d. Brink; H. F. D. Linders; S. Wittekoek

doi:10.1117/12.963703

20 August 1986 Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System

M. A. v. d. Brink, H. F. D. Linders, S. Wittekoek

Author Affiliations +

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963703
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

An improved version of the Philips/ASM-L phase grating alignment system is described. The new system can be used in combination with standard, single-sided telecentric projection lenses, by using a spatial filter external to the lens. In addition, the alignment-detection has been extended to a double system which enables direct control of magnification and die rotation. Long-term frame instability and changes in environmental conditions such as temperature and barometric pressure have no influence on the overlay accuracy. The new external spatial filtering technique gives the same proven benefits as the earlier spatial filtering which was built internal to the lenses. A comparison of this alignment scheme with other methods is given, showing that this new scheme is superior in terms of dependence on external influences.

Citation Download Citation

M. A. v. d. Brink, H. F. D. Linders, and S. Wittekoek "Direct-Referencing Automatic Two-Points Reticle-To-Wafer Alignment Using A Projection Column Servo System", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963703

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