Enhanced Performance Of Optical Lithography Using The DESIRE System

Fedor Coopmans; Bruno Roland

doi:10.1117/12.963730

20 August 1986 Enhanced Performance Of Optical Lithography Using The DESIRE System

Fedor Coopmans, Bruno Roland

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963730
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

We report on the impact of the use of the DESIRE system in optical lithography. Results obtained with first and second generation resists are compared with the performance of the DESIRE system. This comparative study was done for scanning projection, lx stepper and reduction stepper equipment. The in-process compatibility of the new dry developed resist system is described. Thermal stability up to 300°C and good resistance to dry etching are reported. Also the impact of the addition of a color dye to the DESIRE-resin on the line-width control is demonstrated.

Citation Download Citation

Fedor Coopmans and Bruno Roland "Enhanced Performance Of Optical Lithography Using The DESIRE System", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963730

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