Impact Of 1X Reticle Defects For Submicron Production Lithography

K. L. Zollinger; C. P. O'Mahony; M. S. Chang

doi:10.1117/12.963711

20 August 1986 Impact Of 1X Reticle Defects For Submicron Production Lithography

K. L. Zollinger, C. P. O'Mahony, M. S. Chang

Proceedings Volume 0633, Optical Microlithography V; (1986) https://doi.org/10.1117/12.963711
Event: 1986 Microlithography Conferences, 1986, Santa Clara, United States

Abstract

A new test reticle with programmed defects has been designed to evaluate the impact of 1X reticle defects for micron and submicron design rules. This reticle has been used to examine the performance of the present generation of automatic reticle inspection systems, as well as to investigate the printability of defects using a 1 um 1X lens. Printability of contact holes, shaped contacts, and pinholes have been compared. Conclusions relevant to the manufacture of 1X reticles for micron and submicron device work are presented here.

Citation Download Citation

K. L. Zollinger, C. P. O'Mahony, and M. S. Chang "Impact Of 1X Reticle Defects For Submicron Production Lithography", Proc. SPIE 0633, Optical Microlithography V, (20 August 1986); https://doi.org/10.1117/12.963711

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