Uncertainty evaluation of ellipsometer: from instrumentation to material and application in Avogadro's project

Wende Liu; Chi Chen; Qiming Fan; Chu Chu

doi:10.1117/12.2246391

24 November 2016 Uncertainty evaluation of ellipsometer: from instrumentation to material and application in Avogadro's project

Wende Liu, Chi Chen, Qiming Fan, Chu Chu

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Proceedings Volume 10023, Optical Metrology and Inspection for Industrial Applications IV; 100231Y (2016) https://doi.org/10.1117/12.2246391
Event: SPIE/COS Photonics Asia, 2016, Beijing, China

Abstract

As directly acquired by ellipsometer, the ellipsometric angles obtain their uncertainties from the instrument. As a metrological tool, one is interest in the derived parameters from the ellipsometric angles, therefore acquiring uncertainties from both instrument and material. As the relative variation of parameters are of interest, ellipsometers are very sensitive and precise. However, for extracting absolute values, calibration by independent method is necessary to elliminate the uncertaintie from the instrument and material. A framework for evaluating the uncertainties from the instrument related parameters, such as the wavelength, bandwidth, the angle of incidence, is given in this work. The framework could facilitate the use of ellipsometer for general measurement of various thin films other than limited type of films like SiO₂ or SiN_x on Si. For evaluating material related parameters, a typical application in the characterization of surface of silicon sphere is investigated by carefully investigating into the optical constants of sublayers.

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Wende Liu, Chi Chen, Qiming Fan, and Chu Chu "Uncertainty evaluation of ellipsometer: from instrumentation to material and application in Avogadro's project", Proc. SPIE 10023, Optical Metrology and Inspection for Industrial Applications IV, 100231Y (24 November 2016); https://doi.org/10.1117/12.2246391

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KEYWORDS

Silicon

Calibration

Silicon films

Optical spheres

Metrology

Statistical analysis

Thin films

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