Metrology capabilities and needs for 7nm and 5nm logic nodes

Benjamin Bunday; Eric Solecky; Alok Vaid; A. F. Bello; Xintuo Dai

doi:10.1117/12.2260870

28 March 2017 Metrology capabilities and needs for 7nm and 5nm logic nodes

Benjamin Bunday, Eric Solecky, Alok Vaid, A. F. Bello, Xintuo Dai

Proceedings Volume 10145, Metrology, Inspection, and Process Control for Microlithography XXXI; 101450G (2017) https://doi.org/10.1117/12.2260870
Event: SPIE Advanced Lithography, 2017, San Jose, California, United States

Abstract

This paper will provide a high level overview of the future for in-line high volume manufacturing (HVM) metrology for the semiconductor industry, concentrating on logic applications. First, we will take a broad view of the needs of patterned defect, critical dimensional (CD/3D), overlay and films metrology, and present the extensive list of applications for which metrology solutions are needed. Commonalities and differences among the various applications will be shown. We will then report on the gating technical limits of the most important of these metrology solutions to address the metrology challenges of future nodes, highlighting key metrology technology gaps requiring industry attention and investment

Citation Download Citation

Benjamin Bunday, Eric Solecky, Alok Vaid, A. F. Bello, and Xintuo Dai "Metrology capabilities and needs for 7nm and 5nm logic nodes", Proc. SPIE 10145, Metrology, Inspection, and Process Control for Microlithography XXXI, 101450G (28 March 2017); https://doi.org/10.1117/12.2260870

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