Morphological characterization has shown a line-pattern structure with small alterations depending on the fluence of the laser (85 mJ/cm2 or 165 mJ/cm2). In order to understand these modifications, a simulation has been carried out to model the transient temperature during the DLIP to study the temperature reached by the ZnO surface for the different fluences. Moreover, a comparison with a non-interference energy distribution pulse is also simulated to corroborate the model. For samples processed by DLIP, a thermal annealing effect has been noticed when temperatures at the surface are between 1000K and 1800K. Due to the slow cooling process, a possible recrystallization of the material similar to a thermal treatment is obtained. For temperatures close or higher than 1800K, the material starts to ablate. |
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Zinc oxide
Laser processing
Lithography
Thermal effects
Optical lithography
Sputter deposition
Thermal modeling