Processing issues and modeling

A. R. Neureuther

doi:10.1117/12.2284077

30 August 2017 Processing issues and modeling

A. R. Neureuther

Proceedings Volume 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition; 1032004 (2017) https://doi.org/10.1117/12.2284077
Event: Tutorial Texts in Optical Engineering Series 1991, 1991, Bellingham, WA, United States

Abstract

A brief perspective is given initially on the goals, exposure methods, performance and challenges in the lithography process. The basic framework for simulating optical lithog- raphy is then presented using three important physical aspects: imaging, resist exposure- bleaching and resist development etching. Image quality in both contact/proximity and projection printing are considered. The verification by comparison of simulated resist pro- files with SEM cross sections from resist images on wafers in then considered. The chap- ter concludes with a discussion of the challenges facing projection printing and the technology directions emerging to meet them. Greater detail on many of the concepts and models introduced in this Chapter can be found in subsequent chapters.

Citation Download Citation

A. R. Neureuther "Processing issues and modeling", Proc. SPIE 10320, An Introduction to Biological and Artificial Neural Networks for Pattern Recognition, 1032004 (30 August 2017); https://doi.org/10.1117/12.2284077

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available