Large area of MCP electronic rinse system design

Yafeng Qiu; Zhigang Yan; Chengxin Song

doi:10.1117/12.2272228

23 August 2017 Large area of MCP electronic rinse system design

Yafeng Qiu, Zhigang Yan, Chengxin Song

Proceedings Volume 10371, Optomechanical Engineering 2017; 103710X (2017) https://doi.org/10.1117/12.2272228
Event: SPIE Optical Engineering + Applications, 2017, San Diego, California, United States

Abstract

Based on the study of the current technology of MCP electron rinse and parameters testing, a new electron rinse and testing system with four working stations for large area MCP is developed. In this system, electron rinse for various large area MCP of diameter less than 100mm can be conducted on each station at the same time, and parameters could be tested at one of the stations in the process of the electron rinse at different stages. Four stations in the vacuum system can be converted to each other quickly and accurately by operating the mechanical transmission structure designed. The system's superior performance was shown by a series of tests and data.

Citation Download Citation

Yafeng Qiu, Zhigang Yan, and Chengxin Song "Large area of MCP electronic rinse system design", Proc. SPIE 10371, Optomechanical Engineering 2017, 103710X (23 August 2017); https://doi.org/10.1117/12.2272228

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available