Allowable SEM noise for unbiased LER measurement

George Papavieros; Vassilios Constantoudis; Evangelos Gogolides

doi:10.1117/12.2306509

13 March 2018 Allowable SEM noise for unbiased LER measurement

George Papavieros, Vassilios Constantoudis, Evangelos Gogolides

Proceedings Volume 10585, Metrology, Inspection, and Process Control for Microlithography XXXII; 105851W (2018) https://doi.org/10.1117/12.2306509
Event: SPIE Advanced Lithography, 2018, San Jose, California, United States

Abstract

Recently, a novel method for the calculation of unbiased Line Edge Roughness based on Power Spectral Density analysis has been proposed. In this paper first an alternative method is discussed and investigated, utilizing the Height-Height Correlation Function (HHCF) of edges. The HHCF-based method enables the unbiased determination of the whole triplet of LER parameters including besides rms the correlation length and roughness exponent. The key of both methods is the sensitivity of PSD and HHCF on noise at high frequencies and short distance respectively. Secondly, we elaborate a testbed of synthesized SEM images with controlled LER and noise to justify the effectiveness of the proposed unbiased methods. Our main objective is to find out the boundaries of the method in respect to noise levels and roughness characteristics, for which the method remains reliable, i.e the maximum amount of noise allowed, for which the output results cope with the controllable known inputs. At the same time, we will also set the extremes of roughness parameters for which the methods hold their accuracy.

Citation Download Citation

George Papavieros, Vassilios Constantoudis, and Evangelos Gogolides "Allowable SEM noise for unbiased LER measurement", Proc. SPIE 10585, Metrology, Inspection, and Process Control for Microlithography XXXII, 105851W (13 March 2018); https://doi.org/10.1117/12.2306509

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