Evaporated Fatty Acid Resist Process

Hisato Kato; Shinzo Morita; Masahiro Tawata; Shuzo Hattori

doi:10.1117/12.953035

30 January 1989 Evaporated Fatty Acid Resist Process

Hisato Kato, Shinzo Morita, Masahiro Tawata, Shuzo Hattori

Proceedings Volume 1086, Advances in Resist Technology and Processing VI; (1989) https://doi.org/10.1117/12.953035
Event: 1989 Santa Clara Symposium on Microlithography, 1989, San Jose, CA, United States

Abstract

Double layer resist process using fatty acid and Al was proposed for fine pattern fabrication. Oriented thin films of stearic acid and w-tricosenoic acid were formed on an Al evaporated substrate by evaporation using a furnace with an orifice of a few mm diameter. Electron beam exposure characteristics of the films were studied and 2um L/S pattern was successfully developed by heating the substrate and C12 etching of Al.

Citation Download Citation

Hisato Kato, Shinzo Morita, Masahiro Tawata, and Shuzo Hattori "Evaporated Fatty Acid Resist Process", Proc. SPIE 1086, Advances in Resist Technology and Processing VI, (30 January 1989); https://doi.org/10.1117/12.953035

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