Advanced particle contamination control in EUV scanners

Mark van de Kerkhof; Tjarko van Empel; Michael Lercel; Christophe Smeets; Ferdi van de Wetering; Andrey Nikipelov; Christian Cloin; Andrei Yakunin; Vadim Banine

doi:10.1117/12.2514874

26 March 2019 Advanced particle contamination control in EUV scanners

Mark van de Kerkhof, Tjarko van Empel, Michael Lercel, Christophe Smeets, Ferdi van de Wetering, Andrey Nikipelov, Christian Cloin, Andrei Yakunin, Vadim Banine

Author Affiliations +

Proceedings Volume 10957, Extreme Ultraviolet (EUV) Lithography X; 109570U (2019) https://doi.org/10.1117/12.2514874
Event: SPIE Advanced Lithography, 2019, San Jose, California, United States

Abstract

With the introduction of the NXE:3400B scanner, ASML has brought EUV to High-Volume Manufacturing (HVM). In this context, ASML is pursuing a dual-path approach towards zero reticle defectivity: EUV-compatible pellicle or zero particles towards reticle by advanced particle contamination control. This paper will focus on the latter approach of advanced particle contamination control and will show that we are able to reduce particle contamination towards reticle to a level that is compatible with HVM requirements for sub-10nm node lithography.

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Mark van de Kerkhof, Tjarko van Empel, Michael Lercel, Christophe Smeets, Ferdi van de Wetering, Andrey Nikipelov, Christian Cloin, Andrei Yakunin, and Vadim Banine "Advanced particle contamination control in EUV scanners", Proc. SPIE 10957, Extreme Ultraviolet (EUV) Lithography X, 109570U (26 March 2019); https://doi.org/10.1117/12.2514874

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