Antireflective surfaces for astro-photonic applications

Daniel Smith; Nguyen Hoai An Le; Soon Hock Ng; Saulius Juodkazis

doi:10.1117/12.2541313

31 December 2019 Antireflective surfaces for astro-photonic applications

Daniel Smith, Nguyen Hoai An Le, Soon Hock Ng, Saulius Juodkazis

Proceedings Volume 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019; 112011G (2019) https://doi.org/10.1117/12.2541313
Event: ANZCOP, 2019, Melbourne, Australia

Abstract

Antireflection patterns for optical elements used in astro-photonic applications require optimisation for different wavelengths, a defined angular selectivity and have to be made on large curved surfaces. Sputtered film of tens-of-nm of gold was annealed at 500°C for 1 hour to form a pattern of nano-islands used as a mask for plasma etching. Separation between islands depended on the annealing time and an initial film thickness and provides a method to control a characteristic length between etched nano-pillars. Fabricated surfaces were characterised by transmission and reflection spectroscopy.

Citation Download Citation

Daniel Smith, Nguyen Hoai An Le, Soon Hock Ng, and Saulius Juodkazis "Antireflective surfaces for astro-photonic applications", Proc. SPIE 11201, SPIE Micro + Nano Materials, Devices, and Applications 2019, 112011G (31 December 2019); https://doi.org/10.1117/12.2541313

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