Multipulse Laser Synthesis Of Metal Silicides

E. D'Anna; G. Leggieri; A. Luches; G. Majni; M. Martino; P. Mengucci; I. N. Mihailescu

doi:10.1117/12.961571

26 October 1989 Multipulse Laser Synthesis Of Metal Silicides

E. D'Anna, G. Leggieri, A. Luches, G. Majni, M. Martino, P. Mengucci, I. N. Mihailescu

Proceedings Volume 1132, High Power Lasers and Laser Machining Technology; (1989) https://doi.org/10.1117/12.961571
Event: 1989 International Congress on Optical Science and Engineering, 1989, Paris, France

Abstract

Thin films of platinum, molybdenum and titanium silicide were obtained by multipulse excimer laser irradiation of thin platinum, molybdenum and titanium films deposited on silicon single crystals. With this technique, by a proper control of the pulse fluence, it is possible to react a well defined metal thickness. A thin metal film can be left unreacted for successive metallization procedures. By multi-pulse excimer laser irradiation of refractory metal film in nitrogen or ammonia, the contemporaneous synthesis of a silicide layer at the metal/silicon interface and of a nitride film at the sample surface was also obtained. The nitride film acts very well as an interdiffusion barrier in metallization schemes.

Citation Download Citation

E. D'Anna, G. Leggieri, A. Luches, G. Majni, M. Martino, P. Mengucci, and I. N. Mihailescu "Multipulse Laser Synthesis Of Metal Silicides", Proc. SPIE 1132, High Power Lasers and Laser Machining Technology, (26 October 1989); https://doi.org/10.1117/12.961571

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