Effect of annealing on properties and performance of HfO2/SiO2 optical coatings for UV-applications

Matthias Falmbigl; Kyle Godin; Riju Singhal; Jason George; Binyamin Rubin

doi:10.1117/12.2578893

5 March 2021 Effect of annealing on properties and performance of HfO₂/SiO₂ optical coatings for UV-applications

Matthias Falmbigl, Kyle Godin, Riju Singhal, Jason George, Binyamin Rubin

Proceedings Volume 11687, Oxide-based Materials and Devices XII; 116871U (2021) https://doi.org/10.1117/12.2578893
Event: SPIE OPTO, 2021, Online Only

Abstract

The field of ultraviolet (UV)-laser applications is currently experiencing rapid growth in the semiconductor processing, laser micromachining and biomedical markets. A key enabler for these technologies are optical coatings used to manipulate and direct laser beams in a targeted manner. As laser power, laser fluence and pulse frequencies increase, the demands on the physical properties of the coating materials become more stringent. We demonstrate how ion beam sputtering and post-deposition heat treatment are utilized to produce low loss optical coatings at 355 nm and 266 nm. The importance of precisely controlling the sputtering conditions for individual materials is highlighted and the influence of different process parameters on the resulting material properties is discussed. The effect of annealing on key performance parameters for optical coatings such as absorption, stress, roughness, and film structure is investigated. The low absorption achieved in this work results in high laser induced damage thresholds (LIDT) exceeding 2.5 J/cm² and 6.5 J/cm² for highly reflective (HR) mirrors and 7.6 J/cm² and 15.7 J/cm² for antireflective coatings at 266 nm and 355 nm, respectively.

Conference Presentation

Citation Download Citation

Matthias Falmbigl, Kyle Godin, Riju Singhal, Jason George, and Binyamin Rubin "Effect of annealing on properties and performance of HfO₂/SiO₂ optical coatings for UV-applications", Proc. SPIE 11687, Oxide-based Materials and Devices XII, 116871U (5 March 2021); https://doi.org/10.1117/12.2578893

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