Physics Of In-Situ Laser Deposition Of Superconducting Thin Films

H. S. Kwok; D. T. Shaw; Q. Y. Ying; J. P. Zheng; S. Witanachchi; E. Petrou; H. S. Kim

doi:10.1117/12.965158

19 March 1990 Physics Of In-Situ Laser Deposition Of Superconducting Thin Films

H. S. Kwok, D. T. Shaw, Q. Y. Ying, J. P. Zheng, S. Witanachchi, E. Petrou, H. S. Kim

Proceedings Volume 1187, Processing of Films for High Tc Superconducting Electronics; (1990) https://doi.org/10.1117/12.965158
Event: 1989 Microelectronic Integrated Processing Conferences, 1989, Santa Clara, United States

Abstract

The physics of the in-situ laser deposition process is reviewed. Emphasis will be placed on the use of excimer lasers, and the deposition of YBCO thin films. It will be shown that the laser target interaction conditions, and the properties of the laser generated plume are inducive to the formation of high quality films. In addition to the formation of energetic atomic beams, laser deposition is also highly compatible with reactive deposition which make it suitable for oxide and nitride films. An in-situ diagnostic technique is introduced which is capable of detecting the inter-facial boundary layer between the film and the substrate. It is also shown that post-deposition in-situ oxidation is necessary for the formation of superconducting films.

Citation Download Citation

H. S. Kwok, D. T. Shaw, Q. Y. Ying, J. P. Zheng, S. Witanachchi, E. Petrou, and H. S. Kim "Physics Of In-Situ Laser Deposition Of Superconducting Thin Films", Proc. SPIE 1187, Processing of Films for High Tc Superconducting Electronics, (19 March 1990); https://doi.org/10.1117/12.965158

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