Paper
27 March 2022 Study on influence factors of dilation uniformity in pulse-dilation framing camera
Wu Siqi, Bai Yanli, Zhong Si
Author Affiliations +
Proceedings Volume 12169, Eighth Symposium on Novel Photoelectronic Detection Technology and Applications; 121691T (2022) https://doi.org/10.1117/12.2622419
Event: Eighth Symposium on Novel Photoelectronic Detection Technology and Applications, 2021, Kunming, China
Abstract
The pulse-dilation framing camera is modeled and the cause of its dilation non-uniformity is introduced, the influence factors of dilation uniformity is studied and the non-uniformity is quantitatively analyzed using relative errors. The research results show that the dilation uniformity along the photocathode(PC) is gradually get worse by decreasing acceleration energy, increasing gradient of dilation pulse and enlarging drift length. Especially, the most and minimal serious effects are the gradient and the drift length, respectively. When the length of the PC is 80 mm, the PC voltage is -2 kV and drift length is 0.4 m, with increasing the gradient from 1 V/ps to 5 V/ps, the dilating relative errors is increased from 20.9% to 620.2%. When the PC voltage is -2 kV and gradient is 4 V/ps, with increasing drift length from 0.4 m to 0.8 m, the relative errors is increased from 261.5% to 269.6%. The research is discussed the deficiency of temporal performance in the pulse-dilation framing camera with large PC.
© (2022) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Wu Siqi, Bai Yanli, and Zhong Si "Study on influence factors of dilation uniformity in pulse-dilation framing camera", Proc. SPIE 12169, Eighth Symposium on Novel Photoelectronic Detection Technology and Applications, 121691T (27 March 2022); https://doi.org/10.1117/12.2622419
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KEYWORDS
Cameras

Picosecond phenomena

Microchannel plates

Error analysis

Electron beams

Analytical research

Silicon

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