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Based on commonly used dielectric materials in Si processing platforms, multiple-layer anti-reflection stacks were designed and fabricated, with the main goal of highly efficient light coupling for Si waveguides over a wide wavelength range. Initial characterization results indicate that a <-20dB light reflection was successfully achieved over 1310-1550 nm wavelength range over the whole 150mm wafer. The fluctuation of reflection spectra over the whole wafer was observed to be only 1-2 dB, which guarantees the high yield and mass production capabilities for further applications.
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Fei Sun, Mikko Harjanne, Päivi Heimala, Markku Kapulainen, Timo Aalto, "Monolithically integratable broad-band anti-reflection stacks for Si photonics platforms," Proc. SPIE 12424, Integrated Optics: Devices, Materials, and Technologies XXVII, 124240Y (17 March 2023); https://doi.org/10.1117/12.2647717