Paper
31 July 2023 Fast mask optimization based on self-calibrated convolutions
Author Affiliations +
Proceedings Volume 12747, Third International Conference on Optics and Image Processing (ICOIP 2023); 127470E (2023) https://doi.org/10.1117/12.2689153
Event: Third International Conference on Optics and Image Processing (ICOIP 2023), 2023, Hangzhou, China
Abstract
A mask optimization method based on self-calibrated convolutions is proposed in this paper to reduce the imaging distortion caused by optical proximity effect(OPE). The network model was constructed by combining the inverse lithography technology(ILT), and the parameters of the network model were optimized by the dataset for training. The dataset includes the target pattern and the mask optimized by gradient descent method. The network model based on selfcalibrated convolutions can output an optimized mask according to the target pattern, and the optimized mask is passed through the lithography forward model to obtain the exposure pattern. By the simulation experiment, compared with the traditional gradient-based method, proposed method in this paper has high computational efficiency and small error.
© (2023) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Yichen Zhao, Shuang Xu, and Jinwei Pan "Fast mask optimization based on self-calibrated convolutions", Proc. SPIE 12747, Third International Conference on Optics and Image Processing (ICOIP 2023), 127470E (31 July 2023); https://doi.org/10.1117/12.2689153
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KEYWORDS
Source mask optimization

Calibration

Convolution

Lithography

Education and training

Mathematical optimization

Imaging systems

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