Presentation + Paper
21 November 2023 Actinic blank inspection for high-NA EUV lithography
Tomohiro Suzuki, Ryo Watanabe, Shohei Sakuma, Tomoro Ide
Author Affiliations +
Abstract
Lasertec develops and manufactures inspection and measurement systems that meet the requirements of EUV lithography. Lasertec has successfully developed an actinic blank inspection (ABI) tool and released ABICS E120, a EUV mask blank inspection and review system that contributes to defect management and yield improvement in the production of EUV mask blanks. With the introduction of high-NA EUV scanners and the further progress of process nodes, actinic inspection tools will need to detect even smaller defects. Lasertec is developing a next-generation ABICS for such advanced nodes, eyeing its release in 2024. Its target performance is a sensitivity to detect defects 1nm high and 30nm wide with a coordinate accuracy of 10nm.
Conference Presentation
(2023) Published by SPIE. Downloading of the abstract is permitted for personal use only.
Tomohiro Suzuki, Ryo Watanabe, Shohei Sakuma, and Tomoro Ide "Actinic blank inspection for high-NA EUV lithography", Proc. SPIE 12751, Photomask Technology 2023, 127510E (21 November 2023); https://doi.org/10.1117/12.2686239
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KEYWORDS
Extreme ultraviolet lithography

Inspection

Defect detection

Extreme ultraviolet

Actinic inspection

Laser development

Printing

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