Sampling plan optimization and process simulation for CD control

Ulrich Denker; Philip Groeger; Robin Zech; Christoph Ehrlich; Telly Koffas; Samuel Davis

doi:10.1117/12.3010104

9 April 2024 Sampling plan optimization and process simulation for CD control

Ulrich Denker, Philip Groeger, Robin Zech, Christoph Ehrlich, Telly Koffas, Samuel Davis

Proceedings Volume 12955, Metrology, Inspection, and Process Control XXXVIII; 129552I (2024) https://doi.org/10.1117/12.3010104
Event: SPIE Advanced Lithography + Patterning, 2024, San Jose, California, United States

Conference Poster

Abstract

The shrinking of device critical dimensions (CD) requires tighter control of critical dimension uniformity with every new device node. For propagating CD sampling recipes from process development to high-volume manufacturing (HVM), the number of sampled sites needs to be reduced. One of the largest challenges is the optimization of the measurement sample plan without sacrificing fingerprint quality. We developed a sampling optimization module that can predict the impact of CD downsampling on model quality and variability. Two modes of sampling optimization have been evaluated: rule-based (maximizing distances between sites) and data-based (keeping specific CD signatures intact). The optimized sampling plans can be exported or used inside the process control and monitoring software (OVALiS) to down-sample existing dense measurements and verify the performance on unseen datasets. We can rigorously simulate the effect of reduced sampling on CD dose correction and CDU control.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Ulrich Denker, Philip Groeger, Robin Zech, Christoph Ehrlich, Telly Koffas, and Samuel Davis "Sampling plan optimization and process simulation for CD control", Proc. SPIE 12955, Metrology, Inspection, and Process Control XXXVIII, 129552I (9 April 2024); https://doi.org/10.1117/12.3010104

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