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We developed an interferometric coating based on an MgF2/LaF3 multilayer stack deposited by ion-assisted electron-beam deposition. We gradually improved our evaporation setup to reach a high degree of homogeneity, precision and repeatability on the material thicknesses, over the entire mirrors surface. The reflectivity maximum is above 85% and the wavelength at which it occurs is adjustable within 1 nm, while the out-of-band reflectivity between 120 and 155 nm and between 200 nm and 1100 nm is kept below 6% on average never exceeding 8 %. The coating has been space qualified and shows stable performances in conditions representative of the instrument operation environment (thermal cycling under vacuum, radiations, UV exposure…). |
