Recent advancements of multibeam mask writer MBM-3000

Moeka Oshiro; Jumpei Yasuda; Hiroshi Matsumoto; Tomoo Motosugi; Hayato Kimura; Michihiro Kawaguchi; Yoshinori Kojima; Hiroshi Yamashita; Masato Saito; Noriaki Nakayamada

doi:10.1117/12.3034396

26 August 2024 Recent advancements of multibeam mask writer MBM-3000

Moeka Oshiro, Jumpei Yasuda, Hiroshi Matsumoto, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, Noriaki Nakayamada

Author Affiliations +

Proceedings Volume 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology; 131770U (2024) https://doi.org/10.1117/12.3034396
Event: Photomask Japan 2024, 2024, Yokohama, Japan

Abstract

The multi-beam mask writer MBM-3000 designed to achieve N2 device technology node was released. The key concepts of the MBM-3000 are compatible with better resolution and faster throughput than our current multi-beam writer MBM- 2000PLUS. In order to reach these objective, the MBM-3000 is equipped with 12-nm beamlets, a single powerful electron source, a new optics design and enhanced data path systems. The smaller beamlets produce improved resolution and decreased productivity. However, the powerful cathode, which outputs a beam current density of 3.6A/cm², prevent declined throughput. The new optics systems and enhanced data path support both the better resolution and the throughput.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Moeka Oshiro, Jumpei Yasuda, Hiroshi Matsumoto, Tomoo Motosugi, Hayato Kimura, Michihiro Kawaguchi, Yoshinori Kojima, Hiroshi Yamashita, Masato Saito, and Noriaki Nakayamada "Recent advancements of multibeam mask writer MBM-3000", Proc. SPIE 13177, Photomask Japan 2024: XXX Symposium on Photomask and Next-Generation Lithography Mask Technology, 131770U (26 August 2024); https://doi.org/10.1117/12.3034396

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