Dissolution dynamics of poly (4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyl-trimethyl-ammonium hydroxide (A-TMAH) aqueous developers

Jiahao Wang; Takahiro Kozawa

doi:10.1117/12.3032260

12 November 2024 Dissolution dynamics of poly (4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyl-trimethyl-ammonium hydroxide (A-TMAH) aqueous developers

Jiahao Wang, Takahiro Kozawa

Author Affiliations +

Proceedings Volume 13215, International Conference on Extreme Ultraviolet Lithography 2024; 132150T (2024) https://doi.org/10.1117/12.3032260
Event: SPIE Photomask Technology + EUV Lithography, 2024, Monterey, California, United States

Conference Poster

Abstract

The novel developers with low biotoxicity have attracted considerable attention to ensuring environmental sustainability. In this study, the dissolution dynamic of poly (4-hydroxylstyrene) (PHS) partially protected with t-butoxycarbonyl (t-Boc) group in alkyl-trimethyl-ammonium hydroxide (A-TMAH, 0.26N) and tetraethyl-ammonium hydroxide aqueous solutions (TEAH, 0.26N) were investigated by the quartz crystal microbalance (QCM) method. One of the methyl groups of tetramethyl-ammonium hydroxide (TMAH) was substituted by ethyl, propyl, and butyl groups. The dissolution dynamics of PHS and t-Boc PHS films showed different tendencies with the developers. In addition, the diffusion constant of PHS and t-Boc PHS in different developers was obtained from the result of dynamic light scattering (DLS), quantificationally determining their difference in dissolution rates.

(2024) Published by SPIE. Downloading of the abstract is permitted for personal use only.

Citation Download Citation

Jiahao Wang and Takahiro Kozawa "Dissolution dynamics of poly (4-hydroxystyrene) partially protected with t-butoxycarbonyl group in alkyl-trimethyl-ammonium hydroxide (A-TMAH) aqueous developers", Proc. SPIE 13215, International Conference on Extreme Ultraviolet Lithography 2024, 132150T (12 November 2024); https://doi.org/10.1117/12.3032260

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

;

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE