Comparison of reflective mask technologies for soft x-ray projection lithography

Donald M. Tennant; John E. Bjorkholm; Ludwig Eichner; Richard R. Freeman; Tanya E. Jewell; Alastair A. MacDowell; J. Z. Pastalan; L. H. Szeto; Warren K. Waskiewicz; Donald L. White; David L. Windt; Obert R. Wood II

doi:10.1117/12.56938

1 January 1992 Comparison of reflective mask technologies for soft x-ray projection lithography

Donald M. Tennant, John E. Bjorkholm, Ludwig Eichner, Richard R. Freeman, Tanya E. Jewell, Alastair A. MacDowell, J. Z. Pastalan, L. H. Szeto, Warren K. Waskiewicz, Donald L. White, David L. Windt, Obert R. Wood II

Author Affiliations +

Proceedings Volume 1604, 11th Annual BACUS Symposium on Photomask Technology; (1992) https://doi.org/10.1117/12.56938
Event: 11th Annual BACUS Symposium on Photomask Technology, 1991, Sunnyvale, CA, United States

Abstract

We have investigated and compared a variety of technologies for patterning reflective masks for use with X=13 nm soft x-ray illumination. These patterning methods include: absorbing layers deposited on top of multilayer reflectors; reflective coating removal by reactive ion etching; and ion damage of multilayer regions to form a planar mask structure. Large area samples were prepared by each method and reflectivity measurements made to estimate the expected reflectance contrast for mask features. The reflectivity data were compared with simulation for the absorber overlayer and the etched multilayer measurements and found to be in good agreement. Our measured results indicate that reflectivity changes ranging from 5 to over 300 were effected by the various techniques. Fine patterning tests showed that mask features as fine as 0.1 pm can be achieved with each technology. We have also obtained resist images using several different types of x-ray reflection masks. The developed resist images of 0.1 pm lines and spaces obtained using reflection masks in a 20:1 Schwarzschild projection camera compared favorably with transmission mask results obtained using the same optical system.

Citation Download Citation

Donald M. Tennant, John E. Bjorkholm, Ludwig Eichner, Richard R. Freeman, Tanya E. Jewell, Alastair A. MacDowell, J. Z. Pastalan, L. H. Szeto, Warren K. Waskiewicz, Donald L. White, David L. Windt, and Obert R. Wood II "Comparison of reflective mask technologies for soft x-ray projection lithography", Proc. SPIE 1604, 11th Annual BACUS Symposium on Photomask Technology, (1 January 1992); https://doi.org/10.1117/12.56938

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available