New simplified positive-tone DESIRE process using liquid phase silylation in DUV lithography

Ki-Ho Baik; Kurt G. Ronse; Luc Van den Hove; Bruno Roland

doi:10.1117/12.154765

15 September 1993 New simplified positive-tone DESIRE process using liquid phase silylation in DUV lithography

Ki-Ho Baik, Kurt G. Ronse, Luc Van den Hove, Bruno Roland

Proceedings Volume 1925, Advances in Resist Technology and Processing X; (1993) https://doi.org/10.1117/12.154765
Event: SPIE'S 1993 Symposium on Microlithography, 1993, San Jose, CA, United States

Abstract

A simplified positive tone process using liquid phase silylation in DUV lithography is presented in this paper. The diffusion enhanced silylated resist (DESIRE) process has been demonstrated as an attractive solution not only to improve resolution and process latitudes but also to cope with linewidth variations over highly reflective topography. Traditionally the silylation process has been carried out using hexamethlydisilazane (HMDS) although more lately alternative gaseous agents such as tetramethyldisilazane (TMDS) have begun to exhibit certain advantages. This technique requires stringent control of silylation track and dry development equipment. Several new resists (which consist of a novolac based resin with a photo-crosslinker) have been formulated for deep-UV, allowing silylation at room temperature. By using this photo-crosslinker, the PSB (pre-silylation bake) step can be removed. In this way the process can be even more simplified. Characterization of the silylation reaction and mechanism have been performed using thickness measurements, CO emission spectroscopy, Fourier transform infrared absorption (FTIR), and Rutherford backscattering spectroscopy (RBS). In order to explore the limits, this process has also been evaluated using phase shifting masks. The influence of partial coherence on the resolution and process latitudes has also been studied.

Citation Download Citation

Ki-Ho Baik, Kurt G. Ronse, Luc Van den Hove, and Bruno Roland "New simplified positive-tone DESIRE process using liquid phase silylation in DUV lithography", Proc. SPIE 1925, Advances in Resist Technology and Processing X, (15 September 1993); https://doi.org/10.1117/12.154765

ACCESS THE FULL ARTICLE

INSTITUTIONAL
Select your institution to access the SPIE Digital Library.

SELECT YOUR INSTITUTION

PERSONAL
Sign in with your SPIE account to access your personal subscriptions or to use specific features such as save to my library, sign up for alerts, save searches, etc.

PERSONAL SIGN IN

No SPIE Account? Create one

PURCHASE THIS CONTENT

SUBSCRIBE TO DIGITAL LIBRARY

50 downloads per 1-year subscription

Members: $195

Non-members: $335 ADD TO CART

25 downloads per 1 - year subscription

Members: $145

Non-members: $250 ADD TO CART

PURCHASE SINGLE ARTICLE

Includes PDF, HTML & Video, when available