Resulting profile of holographically recorded structures in photoresists

Lucila H. D. Cescato; Bernardo M. de Assuncao Mello; Ivan F. da Costa; Carlos R. A. Lima

doi:10.1117/12.165228

6 December 1993 Resulting profile of holographically recorded structures in photoresists

Lucila H. D. Cescato, Bernardo M. de Assuncao Mello, Ivan F. da Costa, Carlos R. A. Lima

Proceedings Volume 2018, Passive Materials for Optical Elements II; (1993) https://doi.org/10.1117/12.165228
Event: SPIE's 1993 International Symposium on Optics, Imaging, and Instrumentation, 1993, San Diego, CA, United States

Abstract

A theoretical model is developed to compute the resulting profile of structures holographically recorded in photoresists. The model takes into account the effects of exposure, photosensitization and isotropy of wet development. The effects of isotropy of wet development, non-linearity of the photoresist response curve, background-light, and the stationary waves produced by reflection at the film-substrate interface are analyzed using the model and the results are experimentally confirmed.

Citation Download Citation

Lucila H. D. Cescato, Bernardo M. de Assuncao Mello, Ivan F. da Costa, and Carlos R. A. Lima "Resulting profile of holographically recorded structures in photoresists", Proc. SPIE 2018, Passive Materials for Optical Elements II, (6 December 1993); https://doi.org/10.1117/12.165228

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