Study of photoresist pregrooved structures

Changjiu Jiang; Weidong Yang; Lijuan Wang; Dawen Wang; Chunli Bai

doi:10.1117/12.150656

13 August 1993 Study of photoresist pregrooved structures

Changjiu Jiang, Weidong Yang, Lijuan Wang, Dawen Wang, Chunli Bai

Proceedings Volume 2053, Optical Storage (ISOS '92); (1993) https://doi.org/10.1117/12.150656
Event: Optical Storage: Third International Symposium, 1992, Kunming, Yunnan Province, China

Abstract

Theoretical and experimental profiles of pregrooved cross-section in coated photoresist layers with a thickness of 470 nm and 150 nm on glass substrates are given. The experiment has been performed on the photoresist cutting machine using focused argon laser beam and AZ-1350 photoresist. The results from scanning tunneling microscope (STM) and scanning electron microscope (SEM) images are also discussed.

Citation Download Citation

Changjiu Jiang, Weidong Yang, Lijuan Wang, Dawen Wang, and Chunli Bai "Study of photoresist pregrooved structures", Proc. SPIE 2053, Optical Storage (ISOS '92), (13 August 1993); https://doi.org/10.1117/12.150656

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