Evolution of pellicles

Naofumi Inoue; Hiroaki Nakagawa; Masahiro Kondou

doi:10.1117/12.191952

3 November 1994 Evolution of pellicles

Naofumi Inoue, Hiroaki Nakagawa, Masahiro Kondou

Proceedings Volume 2254, Photomask and X-Ray Mask Technology; (1994) https://doi.org/10.1117/12.191952
Event: Photomask Japan '94, 1994, Kawasaki City, Kanagawa, Japan

Abstract

Along with the higher integration of LSI, an implementation of Pellicle as a dust proof on Mask is much more required. Under steady technological developments, such as shorter wave length KrF Excirner laser or Deep UV, Pellicle auto—mounter, and particle detector, the requirements for Pellicle are changing and becoming much more severe. Therefore, we would like to introduce the current pellicle status and the future emphases regarding three main aspects; particle, light transmission, and light resistance, respectively here under.

Citation Download Citation

Naofumi Inoue, Hiroaki Nakagawa, and Masahiro Kondou "Evolution of pellicles", Proc. SPIE 2254, Photomask and X-Ray Mask Technology, (3 November 1994); https://doi.org/10.1117/12.191952

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