Paper
5 August 1994 Extended target tracking and wavefront-sensing technique using intensity-type correlation masks
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Proceedings Volume 2321, Second International Conference on Optoelectronic Science and Engineering '94; (1994) https://doi.org/10.1117/12.182110
Event: Optoelectronic Science and Engineering '94: International Conference, 1994, Beijing, China
Abstract
The correlation wavefront sensing technique using extended, arbitrarily structured target as light source is studied. The principle of extended target correlation wavefront sensing employing an intensity-type mask is analyzed. The problems of simulation and selection of target in laboratory experiments are discussed. The methods of generating the mask images from target structure and of preparing the experimental masks from the mask images are presented. The typical results of the mask images generated by processing the target image are given. A first experiment on the extended target wavefront sensing using the intensity-type mask is made. The effects of two different intensity-type masks on wavefront sensing are compared. The experimental results in agreement with the theory are obtained.
© (1994) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Luogen Deng "Extended target tracking and wavefront-sensing technique using intensity-type correlation masks", Proc. SPIE 2321, Second International Conference on Optoelectronic Science and Engineering '94, (5 August 1994); https://doi.org/10.1117/12.182110
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