Design and fabrication of soft defect test reticles

Steven J. Schuda; Donald Parker

doi:10.1117/12.195813

7 December 1994 Design and fabrication of soft defect test reticles

Steven J. Schuda, Donald Parker

Proceedings Volume 2322, 14th Annual BACUS Symposium on Photomask Technology and Management; (1994) https://doi.org/10.1117/12.195813
Event: 14th Annual BACUS Symposium on Photomask Technology and Management, 1994, Santa Clara, CA, United States

Abstract

Soft reticle defects which print to the wafer are of concern to wafer fabs because of their potential impact on wafer yields. The final mask shop inspection is commonly performed on a laser scattering inspection system. The most common soft defect test reticles in use for evaluating sensitivity of these inspection tools do not represent thin flat transparent contaminates. To address this problem, the Orion test reticles have been designed and built with programmed thin flat transparent soft defects for evaluating sensitivity of inspection systems. The Orion test reticles were inspected with laser scattering and STARlight inspection systems. Results indicate fundamental problems with defect sensitivity and pattern false defects on laser scattering inspection tools. Defect printing experiments demonstrate that the thin flat transparent defect type selected for the Orion reticle design is critical to detect because it prints to the wafer.

Citation Download Citation

Steven J. Schuda and Donald Parker "Design and fabrication of soft defect test reticles", Proc. SPIE 2322, 14th Annual BACUS Symposium on Photomask Technology and Management, (7 December 1994); https://doi.org/10.1117/12.195813

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