Enhancement of ultrashort photoelectric emission sensitivity of metals by alkaline ions implantation

Jean-Pierre Girardeau-Montaut; M. Afif; A. Perez; Claire Girardeau-Montaut; Corinne Tomas

doi:10.1117/12.218365

1 September 1995 Enhancement of ultrashort photoelectric emission sensitivity of metals by alkaline ions implantation

Jean-Pierre Girardeau-Montaut, M. Afif, A. Perez, Claire Girardeau-Montaut, Corinne Tomas

Proceedings Volume 2521, Time-Resolved Electron and X-Ray Diffraction; (1995) https://doi.org/10.1117/12.218365
Event: SPIE's 1995 International Symposium on Optical Science, Engineering, and Instrumentation, 1995, San Diego, CA, United States

Abstract

The production of high photoelectron densities from metallic photocathodes under ultrashort visible and UV-laser finds applications in various fields. Many workers tried, by the use of different techniques, to improve the photoelectric performances of pure metals, essentially W and Mo, but all these prepared photocathodes were not able to withstand very high laser intensities, i.e., >= 1GW/cm². We demonstrate that ion implantation is a valuable new tool to improve the photoelectric emission yield of pure metals. An enhancement of the sensitivity by a factor 5 to 50 was measured in ion potassium implanted tungsten irradiated by subpicosecond laser pulses with peak intensity of a few GW/cm². Data on tungsten implanted by calcium and barium ions is also reported. An investigation of the chemical and physical properties at the origin of this enhancement are also reported. Optical and structural properties of these new materials were investigated by various techniques like reflectometry, ellipsometry, and grazing incidence x-ray diffraction, while the chemical structure of surfaces was determined by AES and XPS. The measurable changes on reflectivity and ellipsometric measurements can be interpreted both by the interface layer due to the radiation induced damage and by a modification of the dielectric function of W in the presence of ion-impurity.

Citation Download Citation

Jean-Pierre Girardeau-Montaut, M. Afif, A. Perez, Claire Girardeau-Montaut, and Corinne Tomas "Enhancement of ultrashort photoelectric emission sensitivity of metals by alkaline ions implantation", Proc. SPIE 2521, Time-Resolved Electron and X-Ray Diffraction, (1 September 1995); https://doi.org/10.1117/12.218365

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