Paper
18 August 1995 Blazed diffraction gratings obtained by ion-milling sinusoidal photoresist gratings
Author Affiliations +
Proceedings Volume 2622, Optical Engineering Midwest '95; (1995) https://doi.org/10.1117/12.216795
Event: Optical Engineering Midwest '95, 1995, Chicago, IL, United States
Abstract
An alternative technique for blazing sinusoidal-profile gratings is discussed. Whereas conventional blazing techniques use an energetic ion beam to mill through a sinusoidal photoresist profile into a substrate, this technque creates the blazed profile in the photoresist itself, without milling into a substrate. Advantages to this technique are discussed, and grating efficiency curves and groove profiles are shown, before and after ion milling. Simulation results that predict the evolution of the groove profile under ion bombardment are also discussed.
© (1995) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Christopher A. Palmer, Jeffrey L. Olson, and Michael M. Dunn "Blazed diffraction gratings obtained by ion-milling sinusoidal photoresist gratings", Proc. SPIE 2622, Optical Engineering Midwest '95, (18 August 1995); https://doi.org/10.1117/12.216795
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Cited by 3 scholarly publications.
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KEYWORDS
Photoresist materials

Diffraction gratings

Etching

Ions

Ion beams

Holography

Image segmentation

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