Paper
21 May 1996 Benefits applications and data analysis techniques for linewidth multilevel experimental design
Anthony Barbieri
Author Affiliations +
Abstract
In contrast to other experimental methods which have just two or three settings per variable, the rationale is presented for using a large number of stepper exposures at poly or active area for certain applications (such as obtaining high correlation to E-TEST variables). How variables (which are dependent on linewidth) relate to each other can also be determined to high correlation; even linear correlation of measured poly linewidth to speed had an R2 value of 0.96. This experimental method is useful for numerous applications such as: process characterization, budgeting of CD linewidths, and correlating process variables to electrical data. Useful data analysis techniques are also shown. The experimental method is also cost- effective, requiring a small number of wafers.
© (1996) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Anthony Barbieri "Benefits applications and data analysis techniques for linewidth multilevel experimental design", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240129
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KEYWORDS
Critical dimension metrology

Semiconducting wafers

Data analysis

Reticles

Diffusion

Cadmium

Manufacturing

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