Rapid and accurate measurements of photoresist refractive index dispersion using the prism coupling method

Robert A. Norwood; Lisa A. Whitney

doi:10.1117/12.240103

21 May 1996 Rapid and accurate measurements of photoresist refractive index dispersion using the prism coupling method

Robert A. Norwood, Lisa A. Whitney

Proceedings Volume 2725, Metrology, Inspection, and Process Control for Microlithography X; (1996) https://doi.org/10.1117/12.240103
Event: SPIE's 1996 International Symposium on Microlithography, 1996, Santa Clara, CA, United States

Abstract

A commercially available instrument (Metricon^TM 2010) was used to perform refractive index measurements at wavelengths of 543 nm, 632.8 nm and 780 nm on AZ^R photoresist and antireflection (AR) coating products. This instrument is computer-controlled and performs all analyses required to determine film indices and thicknesses. The samples were various i-line and g-line photoresists and AR coatings, spun onto silicon at thicknesses of approximately 1 - 2 microns. The reproducibility of the refractive index measurements at different spots on a given sample was found to be very high (usually less than 0.0002) and the time to measure one sample at all the wavelengths was about 15 minutes. The data were fit to a Cauchy function and low error fits were obtained. Most photoresists measured exhibited similar values for the Cauchy coefficients, while BARLi^TM had much different coefficients, owing to its large absorption in the visible.

Citation Download Citation

Robert A. Norwood and Lisa A. Whitney "Rapid and accurate measurements of photoresist refractive index dispersion using the prism coupling method", Proc. SPIE 2725, Metrology, Inspection, and Process Control for Microlithography X, (21 May 1996); https://doi.org/10.1117/12.240103

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