Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography

Chongxi Zhou; Dajian Lin; HanMin Yao

doi:10.1117/12.276059

7 July 1997 Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography

Chongxi Zhou, Dajian Lin, HanMin Yao

Author Affiliations +

Proceedings Volume 3051, Optical Microlithography X; (1997) https://doi.org/10.1117/12.276059
Event: Microlithography '97, 1997, Santa Clara, CA, United States

Abstract

In this paper, the principle of two typical i-line ((lambda) equals 365 nm) and excimer laser ((lambda) equals 248 nm) uniform illumination optical systems based on Cohler illumination is reviewed, the principle and method of the calculation and simulation of intensity distribution of the illumination system for sub-micron photolithography consisting of aspherical surfaces, non-co-axial surfaces and lens array are put forward, that is ray-tracing based on the Snell theorem and spot diagram. At the same time, a program CALOSD made by us is described, two typical results of calculation and simulation of intensity distribution of illumination optical systems are given.

Citation Download Citation

Chongxi Zhou, Dajian Lin, and HanMin Yao "Calculation and simulation of intensity distribution of uniform-illumination optical systems for submicron photolithography", Proc. SPIE 3051, Optical Microlithography X, (7 July 1997); https://doi.org/10.1117/12.276059

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