Paper
24 September 1997 Diffractive optical elements with polarization multiplexing
Author Affiliations +
Abstract
In this paper a method is introduced which makes it possible to choose the paraxial field distribution generated by a diffractive element independently for two perpendicular polarization directions. For that the local transmission of a binary element is controlled by metal-stripe subwavelength gratings of different grating directions fabricated by electron beam lithography. The method based upon the property of these gratings to influence the intensity of an incident wave dependent on their polarization direction. In first experiments such diffractive amplitude elements have been fabricated successfully with the electron beam lithography system LION LV1.
© (1997) COPYRIGHT Society of Photo-Optical Instrumentation Engineers (SPIE). Downloading of the abstract is permitted for personal use only.
Uwe D. Zeitner, Bernd Schnabel, Ernst-Bernhard Kley, and Frank Wyrowski "Diffractive optical elements with polarization multiplexing", Proc. SPIE 3099, Micro-optical Technologies for Measurement, Sensors, and Microsystems II and Optical Fiber Sensor Technologies and Applications, (24 September 1997); https://doi.org/10.1117/12.281237
Lens.org Logo
CITATIONS
Cited by 2 scholarly publications.
Advertisement
Advertisement
RIGHTS & PERMISSIONS
Get copyright permission  Get copyright permission on Copyright Marketplace
KEYWORDS
Polarization

Dielectric polarization

Binary data

Multiplexing

Metals

Electron beam lithography

Opacity

Back to Top