Low-debris laser plasma source

Bo Chen; Jinquang Lin; Xin Zhang; Jianlin Cao

doi:10.1117/12.290264

14 October 1997 Low-debris laser plasma source

Bo Chen, Jinquang Lin, Xin Zhang, Jianlin Cao

Author Affiliations +

Proceedings Volume 3157, Applications of X Rays Generated from Lasers and Other Bright Sources; (1997) https://doi.org/10.1117/12.290264
Event: Optical Science, Engineering and Instrumentation '97, 1997, San Diego, CA, United States

Abstract

In this paper we describe a low debris laser plasma source with cryogenic CO₂ target developed in our institute, which can emit strong line radiation in EUV region even in water window. In particular the source is a very important candidate radiation source for the future EUV lithography production line.

Citation Download Citation

Bo Chen, Jinquang Lin, Xin Zhang, and Jianlin Cao "Low-debris laser plasma source", Proc. SPIE 3157, Applications of X Rays Generated from Lasers and Other Bright Sources, (14 October 1997); https://doi.org/10.1117/12.290264

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